ceramic sputtering target

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China

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( CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.)
High purity metal sputtering target material ( 3N-6N) :
Aluminum target( Al) , chromium target( Cr) , copper target( Cu) , nickel target( Ni) , silicon target( Si) , germanium target( Ge) , niobium target( Nb) , titanium target( Ti) , indium target( In) , silver target( Ag) , tin target( Sn) , graphite target, tantalum target( Ta) , molybdenum target( Mo) , gold target( Au) , hafnium target( Hf) , manganese target( Mn) , zirconium target( Zr) , magnesium target( Mg) , zinc target( Zn) , lead target( Pb) , iridium target( Ir) , yttrium target( Y) , cerium target( Ce) , lanthanum target( La) , ytterbium target( Yb) , gadolinium target( Gd) , platinum target( Pt) , etc..
High density ceramic target ( 3N-5N) :
ITO target, AZO target, IGZO target, magnesium oxide target( MgO) , yttrium oxide target( Y2O3) , iron oxide target( Fe2O3) , nickel oxide target( Ni2O3) , chromium oxide target( Cr2O3) , zinc oxide target( ZnO) , zinc sulfide target( ZnS) , cadmium sulfide target( CdS) , molybdenum disulfide target( MoS2) , silicon dioxide target( SiO2) , silicon monoxide target( SiO) , zirconium dioxide target( ZrO2) , niobium pentoxide target( Nb2O5) , titanium dioxide TiO2 , hafnium oxide target( HfO2) , titanium boride target( TiB2) , zirconium diboride target( ZrB2) , tungstic oxide target( WO3) , aluminum oxide target( Al2O3) , tantalum pentoxide target( Ta2O5) , magnesium fluoride target( MgF2) , zinc selenide target( ZnSe) , aluminum nitride target( AlN) , silicon nitride target( SiN) , boron nitride target( BN) , titanium nitride target( TiN) , silicon carbide target( SiC) , lithium niobate target( LiNbO3) , praseodymium titanate target( PrTiO3) , barium titanate target( BaTiO3) , lanthanum titanate target( LaTiO3) , and so on..
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology— inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99% . In addition, CNM could provide with the metalizing process of the target and unbounded services.
High purity alloy sputtering target: nickel-vanadium alloy target( Ni-V) , nickel-chromium target( Ni-Cr) , titanium-aluminum alloy target( Ti-Al) , silicon-aluminum alloy target( Si-Al) , copper-indium alloy target( Cu-In) , copper-gallium alloy target( Cu-Ga) , copper-indium-gallium alloy target( Cu-In-Ga) , copper-indium-gallium-selenium alloy target( Cu-In-Ga-Se) , stainless steel target, zinc-aluminum alloy target( Zn-Al) , tungsten-titanium alloy target( W-Ti) , iron-cobalt alloy target( Fe-Co) , etc.
Note: CNM product high purity alloy sputtering target: tiny grain size number ( 150-60um) , high relative density ( 99-99.9% ) , high purity ( 99.9-99.999% ) .
In addition, CNM provides with the metalizing process of the target materials and unbounded services.

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